描述
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates Right, 2C, 2AD, 6HP, 3 COL Main Frame: Single Block LD: 3ea, modified to Fortrend配置
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates Left, 2C, 2AD, 6HP, 3 COL Main Frame: Single Block LD: 3ea, modified to FortrendOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
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TEL / TOKYO ELECTRON
MARK 8
已驗證
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105255
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部TEL / TOKYO ELECTRON
MARK 8
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105255
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates Right, 2C, 2AD, 6HP, 3 COL Main Frame: Single Block LD: 3ea, modified to Fortrend配置
2 coat cups, 2 adhesion Hot plates, 6 low temp hot plates, 3 chill plates Left, 2C, 2AD, 6HP, 3 COL Main Frame: Single Block LD: 3ea, modified to FortrendOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔