描述

Multi Block (Resist Coater/Developer)

配置

無配置

OEM 代工型號說明

CLEAN TRACK™ LITHIUS Pro™ V incorporates all of the advanced technology of the proven CLEAN TRACK™ LITHIUS Pro™ V. It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.