描述
FTIR配置
無配置OEM 代工型號說明
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.文檔
無文檔
HITACHI
S-9380 II
已驗證
類別
CD-SEM
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
38546
晶圓尺寸:
6"/150mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
S-9380 II
已驗證
類別
CD-SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
38546
晶圓尺寸:
6"/150mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
FTIR配置
無配置OEM 代工型號說明
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.文檔
無文檔