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LAM RESEARCH / NOVELLUS / GASONICS L3510
    描述
    Dimensions & weight estimates: Mainframe dim (cm): 85 x 110 x 155 Mainframe weight (kg): 200
    配置
    Gasonics L3510 - Asher 200mm convertible: Yes Robot upgrade: HINE Hatm 5.0 atmospheric robot arm Process Gasses: O2 and N2
    OEM 代工型號說明
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
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    已驗證

    類別
    Ashers / Plasma Cleaner

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    132529


    晶圓尺寸:

    6"/150mm


    年份:

    1995


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleaner
    年份: 0條件: 二手
    上次驗證超過60天前

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    verified-listing-icon
    已驗證
    類別
    Ashers / Plasma Cleaner
    上次驗證: 超過60天前
    listing-photo-f7d7fc7c3f194bfe85c1b5ac376943dc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/89835/f7d7fc7c3f194bfe85c1b5ac376943dc/50694b6a9d7c497d92e9f198ccc5c002_200d4d470eb2453eaf03ee00fe455edd1201a_mw.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    132529


    晶圓尺寸:

    6"/150mm


    年份:

    1995


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Dimensions & weight estimates: Mainframe dim (cm): 85 x 110 x 155 Mainframe weight (kg): 200
    配置
    Gasonics L3510 - Asher 200mm convertible: Yes Robot upgrade: HINE Hatm 5.0 atmospheric robot arm Process Gasses: O2 and N2
    OEM 代工型號說明
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
    文檔

    無文檔

    類似上架商品
    查看全部
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleaner年份: 0條件: 二手上次驗證:超過60天前
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleaner年份: 0條件: 二手上次驗證:超過60天前
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleaner年份: 0條件: 二手上次驗證:超過60天前