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BRUKER D8 FABLINE
    描述
    無描述
    配置
    Röntgendiffraktometer zur Messung hochauflösender Röntgenbeugung und Röntgenreflektion mit CU-KA Anode für 6" und 8" Wafer   X-Ray Diffractometer for measuring high resolution X-ray Diffraction and Reflection applications with a Cu-kA Anode for 6 and 8 inch wafers Still in production. Ready for inspection.
    OEM 代工型號說明
    The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.
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    BRUKER

    D8 FABLINE

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    已驗證

    類別

    X-Ray
    上次驗證: 超過60天前
    關鍵商品詳情

    條件:

    未知


    作業狀態:

    未知


    產品編號:

    16327


    晶圓尺寸:

    8"/200mm


    年份:

    2011

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    BRUKER

    D8 FABLINE

    verified-listing-icon

    已驗證

    類別

    X-Ray
    上次驗證: 超過60天前
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    關鍵商品詳情

    條件:

    未知


    作業狀態:

    未知


    產品編號:

    16327


    晶圓尺寸:

    8"/200mm


    年份:

    2011


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Röntgendiffraktometer zur Messung hochauflösender Röntgenbeugung und Röntgenreflektion mit CU-KA Anode für 6" und 8" Wafer   X-Ray Diffractometer for measuring high resolution X-ray Diffraction and Reflection applications with a Cu-kA Anode for 6 and 8 inch wafers Still in production. Ready for inspection.
    OEM 代工型號說明
    The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.
    文檔

    無文檔

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