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TEL / TOKYO ELECTRON EXPEDIUS +
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    配置
    Details attached.
    OEM 代工型號說明
    The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.
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    TEL / TOKYO ELECTRON

    EXPEDIUS +

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    已驗證

    類別

    Wet processing
    上次驗證: 超過60天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    31305


    晶圓尺寸:

    12"/300mm


    年份:

    2007

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    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRONEXPEDIUS +Wet processing
    年份: 2007條件: 二手
    上次驗證23 天前

    TEL / TOKYO ELECTRON

    EXPEDIUS +

    verified-listing-icon

    已驗證

    類別

    Wet processing
    上次驗證: 超過60天前
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/1bdb3d4039d34d66a4d0909eeb9a1d46_d7bfeae340454a5b9d2c455dc0f7fd661105c_mw.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    31305


    晶圓尺寸:

    12"/300mm


    年份:

    2007


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Details attached.
    OEM 代工型號說明
    The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.
    文檔
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON EXPEDIUS +
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    Wet processing年份: 2007條件: 二手上次驗證: 23 天前
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRON
    EXPEDIUS +
    Wet processing年份: 2007條件: 二手上次驗證: 23 天前
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRON
    EXPEDIUS +
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