描述
Batch Wafer Processing Application: Pre Diffusion Clean Damaged / Missing parts: IPA Detect Sensor damage SPM Bath damage配置
Bath-1: SPM Operating: 110 - 150°C, H2SO4/H2O2 (3:1), circulation Chemical spiking: auto concentration feedback Bath Material: Quartz Bath-2: QDR (hot) Operating: DIW rinse (75°C, 40 – 80 L/min) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-3: APM Operating: 35 - 85°C, NH4OH/H2O2/DIW (1:1:15), 15 L/min, circulation Chemical spiking: auto concentration feedback Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-4: POU Operating: 70°C, NH4OH/H2O2 DIW Shower (hot / cold) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-5: HPM Operating: 35 - 80°C, HCL/H2O2/DIW (1:1:5) Bath Material: Quartz Bath-6: QDR (hot) Operating: DIW rinse (75°C, 40 – 80 L/min) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Dryer: SD2 Operating: 49% DHF (1:200), IPA/N2 200°C, 100 L/min Resistivity monitoring (Horiba) Bath Material: PTFEOEM 代工型號說明
The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.文檔
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類別
Wet Benches - Auto
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
21524
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
EXPEDIUS +
類別
Wet Benches - Auto
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
21524
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Batch Wafer Processing Application: Pre Diffusion Clean Damaged / Missing parts: IPA Detect Sensor damage SPM Bath damage配置
Bath-1: SPM Operating: 110 - 150°C, H2SO4/H2O2 (3:1), circulation Chemical spiking: auto concentration feedback Bath Material: Quartz Bath-2: QDR (hot) Operating: DIW rinse (75°C, 40 – 80 L/min) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-3: APM Operating: 35 - 85°C, NH4OH/H2O2/DIW (1:1:15), 15 L/min, circulation Chemical spiking: auto concentration feedback Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-4: POU Operating: 70°C, NH4OH/H2O2 DIW Shower (hot / cold) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Bath-5: HPM Operating: 35 - 80°C, HCL/H2O2/DIW (1:1:5) Bath Material: Quartz Bath-6: QDR (hot) Operating: DIW rinse (75°C, 40 – 80 L/min) Bath Material: PTFE Megasonic: 950 kHz, 2400W (600*4) Dryer: SD2 Operating: 49% DHF (1:200), IPA/N2 200°C, 100 L/min Resistivity monitoring (Horiba) Bath Material: PTFEOEM 代工型號說明
The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.文檔
無文檔