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LAM RESEARCH / SEZ SP102
    描述
    No missing parts
    配置
    102N -Spin processor
    OEM 代工型號說明
    The SEZ 102 is a Spin-Processor for single wafer processing. It supports 3, 4, 5, and 6-inch wafers on 150mm and has multiple vertically integrated process chambers. The system is fully automatic and can recycle, heat, and filter chemical solutions. It supports a wide range of applications including photolithography yield enhancement, back surface metal clean, back surface film removal, bevel/edge film removal, silicon etch, stress relief, post-etch polymer removal, oxide etching, post CMP clean, film structuring (BEOL), wafer manufacturing enhancement, and GaAs processing.
    文檔
    文件圖示

    SEZ.pdf

    LAM RESEARCH / SEZ

    SP102

    verified-listing-icon

    已驗證

    類別
    Wet Etch

    上次驗證: 超過60天前

    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    89163

    晶圓尺寸:

    6"/150mm

    年份:

    2003

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    LAM RESEARCH / SEZ SP102

    LAM RESEARCH / SEZ

    SP102

    Wet Etch
    年份: 2003條件: 二手
    上次驗證超過60天前

    LAM RESEARCH / SEZ

    SP102

    verified-listing-icon
    已驗證
    類別
    Wet Etch
    上次驗證: 超過60天前
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    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    89163

    晶圓尺寸:

    6"/150mm

    年份:

    2003

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    No missing parts
    配置
    102N -Spin processor
    OEM 代工型號說明
    The SEZ 102 is a Spin-Processor for single wafer processing. It supports 3, 4, 5, and 6-inch wafers on 150mm and has multiple vertically integrated process chambers. The system is fully automatic and can recycle, heat, and filter chemical solutions. It supports a wide range of applications including photolithography yield enhancement, back surface metal clean, back surface film removal, bevel/edge film removal, silicon etch, stress relief, post-etch polymer removal, oxide etching, post CMP clean, film structuring (BEOL), wafer manufacturing enhancement, and GaAs processing.
    文檔
    文件圖示

    SEZ.pdf

    類似上架商品
    查看全部
    LAM RESEARCH / SEZ SP102

    LAM RESEARCH / SEZ

    SP102

    Wet Etch年份: 2003條件: 二手上次驗證:超過60天前