描述
CLEAN配置
無配置OEM 代工型號說明
The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.文檔
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SCREEN / DNS / DAINIPPON SCREEN
FC-3000
已驗證
類別
Wet Benches - Auto
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
118556
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SCREEN / DNS / DAINIPPON SCREEN
FC-3000
類別
Wet Benches - Auto
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
118556
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CLEAN配置
無配置OEM 代工型號說明
The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.文檔
無文檔