描述
Manufacturer: ENGIS Model: EJD-9BL Equipment Type: Double-Sided Lapping & Polishing Machine Lapping Plate Size (OD): 635 mm Carrier Type: DP12 Carrier Outer Diameter: 232.7 mm Lower Plate Speed: 10–40 rpm Main Motor Power: 3.7 kW Drive System: 4-Way Drive Power Supply: AC 200V, 3-Phase, 50/60Hz Machine Dimensions (W x D x H): 1,500 x 1,200 x 2,300 mm Machine Weight (Net): 2,000 kg配置
無配置OEM 代工型號說明
The EJD-9BL is a double-sided polishing machine that belongs to the EJD series. It supports a wide range of lapping and CMP processing of conventional abrasives, diamond abrasive, and fixed abrasive plates. The standard full safety cover makes it suitable for use in a semiconductor manufacturing environment. Additionally, it comes with a variety of optional functions such as real-time part thickness detection, actual pressure monitor and control, and low-pressure, low-speed descent control of the upper surface lapping platen. These features are essential for simultaneous double-sided polishing of thin wafers.文檔
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ENGIS
EJD-9BL
類別
Wafer Lapping
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
153625
晶圓尺寸:
未知
年份:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Manufacturer: ENGIS Model: EJD-9BL Equipment Type: Double-Sided Lapping & Polishing Machine Lapping Plate Size (OD): 635 mm Carrier Type: DP12 Carrier Outer Diameter: 232.7 mm Lower Plate Speed: 10–40 rpm Main Motor Power: 3.7 kW Drive System: 4-Way Drive Power Supply: AC 200V, 3-Phase, 50/60Hz Machine Dimensions (W x D x H): 1,500 x 1,200 x 2,300 mm Machine Weight (Net): 2,000 kg配置
無配置OEM 代工型號說明
The EJD-9BL is a double-sided polishing machine that belongs to the EJD series. It supports a wide range of lapping and CMP processing of conventional abrasives, diamond abrasive, and fixed abrasive plates. The standard full safety cover makes it suitable for use in a semiconductor manufacturing environment. Additionally, it comes with a variety of optional functions such as real-time part thickness detection, actual pressure monitor and control, and low-pressure, low-speed descent control of the upper surface lapping platen. These features are essential for simultaneous double-sided polishing of thin wafers.文檔
無文檔