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memsstar Orbis 3000
    描述
    Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oC
    配置
    Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    memsstar

    Orbis 3000

    verified-listing-icon

    已驗證

    類別
    Wafer Handling

    上次驗證: 2 天前

    關鍵商品詳情
    條件:

    New

    作業狀態:

    未知

    產品編號:

    147939

    晶圓尺寸:

    未知

    年份:

    2021

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    memsstar Orbis 3000

    memsstar

    Orbis 3000

    Wafer Handling
    年份: 2021條件: 全新
    上次驗證2 天前

    memsstar

    Orbis 3000

    verified-listing-icon
    已驗證
    類別
    Wafer Handling
    上次驗證: 2 天前
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/172a2ee8e60e4d75bdf49f1de8555305_f97e0e8d674b45d4b9a545fa9da1433b_mw.png
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/1755581d21ef48309483e5ca0a49f763_83a57e9dc875488c9834d696bcfe52ce45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/4325a707e2ff48f39bdc3e67ef2d1476_19ba016b2a8a4e779652e64eb60d31ae45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/16fd27f29481444caab378212b5f19e0_f3c76a2c7ec943fca050c85d4a012bea45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/776675a42d0d45a6b3e1b4383cfddf6a_20096804f89c4c7d9b060fe4e4cf41ed45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/16a69cac0c504518a056ce1af805e92b_5ae2e145d05a4b91835ee0467710baf845005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/2055378e96be4b208cb257987e5dc058_0b156a9c6a84483185b21e590e7bd04a45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/4f00992e9b8f4945ad03f322eaa7a81d_198842cd24b4407a9c64ec9133dd557145005c_mw.jpeg
    關鍵商品詳情
    條件:

    New

    作業狀態:

    未知

    產品編號:

    147939

    晶圓尺寸:

    未知

    年份:

    2021

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oC
    配置
    Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    類似上架商品
    查看全部
    memsstar Orbis 3000

    memsstar

    Orbis 3000

    Wafer Handling年份: 2021條件: 全新上次驗證:2 天前