描述
無描述配置
Nanospec AFT 3000 (precise measurements of film thickness of single layers such as photoresists, oxides and nitrides, as well as the top layer on film stacks of up to three layers in the thickness range 200Angstroms - 35microns)vOEM 代工型號說明
The NanoSpec 3000 film thickness measurement system is a state of the art, small spot spectroscopic reflectometer, built on a simple to use tabletop platform. A modern solid state linear diode array reflectometer is used to insure measurement speed and accuracy. The NanoSpec 3000 provides scanning from 480 to 800nm and can measure single-layer films such as oxide, nitride and photoresist, as well as multiple layer film stacks. Measurements can also be made on a \vide variety of other substrates including silicon, aluminum and gallium arsenide.文檔
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 3000
已驗證
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
98588
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 3000
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
98588
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Nanospec AFT 3000 (precise measurements of film thickness of single layers such as photoresists, oxides and nitrides, as well as the top layer on film stacks of up to three layers in the thickness range 200Angstroms - 35microns)vOEM 代工型號說明
The NanoSpec 3000 film thickness measurement system is a state of the art, small spot spectroscopic reflectometer, built on a simple to use tabletop platform. A modern solid state linear diode array reflectometer is used to insure measurement speed and accuracy. The NanoSpec 3000 provides scanning from 480 to 800nm and can measure single-layer films such as oxide, nitride and photoresist, as well as multiple layer film stacks. Measurements can also be made on a \vide variety of other substrates including silicon, aluminum and gallium arsenide.文檔
無文檔