描述
Nanometrics Nanospec 210 Film Thickness Measure配置
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM 代工型號說明
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
已驗證
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
66020
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
66020
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Nanometrics Nanospec 210 Film Thickness Measure配置
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM 代工型號說明
未提供文檔
無文檔