ONTO / NANOMETRICS / ACCENT / BIO-RAD ATLAS II+

描述

Film thickness and stress measurement capabilities

配置

Purchased as an Atlas II and converted to an Atlas II+ (next gen SE optics, upgraded computer, and upgraded software). IRSE capability was added to cover the wavelength range 190-1700nm. 8750-035022 T D K E4+ Loadport w/ Hermos RFID BCR 2 INCLUDED LYNX SW Version 5.5.4.0 INCLUDED 200mm Cassette Adaptor INCLUDED Film Thickness Standard Wafer 300MM INCLUDED LYNX SW Version 5.5.0.0 INCLUDED Robot (300mm Only) User Interface Kit - Mobile INCLUDED LYNX SECS License and Manual INCLUDED Dongle LYNX EFEM Base Lynx 2 Wide, Dual Paddle EG INCLUDED Matrox Pattern Recognition USB INCLUDED Atlas II LYNX Runtime SECS INCLUDED 190-1000 nm spectroscopic ellipsometer 210-1000 nm direct Xenon reflectometer Atlas II Interface Kit INCLUDED Atlas II metrology system including: 300 mm precision XY Theta stage LCD flatscreen monitor and touch pad, 4 port Base Rack (ROW, slide-out keyboard, INCLUDED Parallel Fitting INCLUDED Stage Accuracy INCLUDED Stage Z-Map INCLUDED SE Fitting INCLUDED Film stress capability INCLUDED Optimized Coreogrophy INCLUDED Advanced Focus INCLUDED Advanced Mueller Matrix INCLUDED Advanced Pattern Recognition INCLUDED SE IF (ENGINEERING) INCLUDED Film Library Fitting INCLUDED SECS Communication INCLUDED NANODIFFRACT INCLUDED Matrox Pattern Recognition INCLUDED Focus X INCLUDED Focus FR INCLUDED SLK, Atlas, LAM INCLUDED Basic Access INCLUDED

OEM 代工型號說明

The Atlas II+ is an advanced Optical CD (OCD) Metrology System developed by Nanometrics. It is designed for high-performance process control metrology and incorporates innovations in optical components, precision wafer positioning, and new software analysis. The system is capable of measuring the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. It also provides unprecedented stability in focus performance and can measure a range of structures, including asymmetric spacers and 3-D gratings. The Atlas II+ is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with spectroscopic reflectometer (SR) and spectroscopic ellipsometer (SE) metrology modules. It also offers a doubling of wafer throughput and an order of magnitude improvement in wafer positioning precision, enabling significant increases in data volume and lowering the system’s cost of ownership. Additionally, it can be optionally equipped with NanoCD Suite for OCD and wafer stress/bow measurement capabilities.