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TEL / TOKYO ELECTRON TELFORMULA
    描述
    無描述
    配置
    Details attached below
    OEM 代工型號說明
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
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    TEL / TOKYO ELECTRON

    TELFORMULA

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    已驗證

    類別
    Thermal Processing

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    78743


    晶圓尺寸:

    未知


    年份:

    未知

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    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Thermal Processing
    年份: 2003條件: 二手
    上次驗證超過30天前

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon
    已驗證
    類別
    Thermal Processing
    上次驗證: 超過60天前
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    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    78743


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Details attached below
    OEM 代工型號說明
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    文檔
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Thermal Processing年份: 2003條件: 二手上次驗證: 超過30天前
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Thermal Processing年份: 2005條件: 二手上次驗證: 超過30天前
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Thermal Processing年份: 2007條件: 二手上次驗證: 超過60天前