概述

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Supports various evaporation sources (i.e. EB, RH, EB + RH etc.). Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.). Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics. Display and operation on LCD touch panel. Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).