Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

ULVAC

EI-5K

EI-7K

EBX 1000

Batch Type System
Various evaporation sources can be loaded. (EB,
RH, EB + RH)

Substrate size: φ2 to 6 inch Supports rectangular,
Si, compounds, glass and ceramics substrates

EI-7L

Mini-Lab

CRTM 9000

EBX  6D

Substrate size: φ2 to 6 inch Supports rectangular,
Si, compounds, glass and ceramics substrates

ei-5

EBX 2000

EBB-16C

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).

EI-5Z

YH 500AS

batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. 


Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).



EI-5T

EBX 2000C

Loaded number / Revolution dome: 44 pc…Φ4 in / 20 pc…Φ6 in
SS distance: 900mm
Substrate holder: Revolution, Planetary or Satellite can be selected
Incident angle (Lift-off): 3.3°…Φ 4 in 4.9°…Φ 6 in

ULVAC

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EI-5K

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EI-7K

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EBX 1000

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EI-7L

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