ULVAC

EBS 10A

batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. 


Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).



EI-5T

EX 550

EX-400-C08

EX-550-D10-B

EX-550-T10

EBX 8C

EBB-16C

YH 500AS

EBX 10D

CV-200

EX 650

Batch type high vacuum evaporation equipment ei series is equipment that can form metal film or oxide film on the substrate. It can be controlled centrally through the operation panel to realize centralized automatic operation of vacuuming, film forming and other operations, which is suitable for research and development and small-scale production

EI-501z

Satella is an advanced system designed for organic deposition processes, featuring a multiple independent chamber configuration that enables efficient full-color device production, a task challenging for its counterpart Solciet. It boasts a unique 7-sided transfer chamber and accommodates 2 to 4 organic deposition chambers, adjustable as required. Additionally, Satella is equipped with a high-precision mask alignment mechanism, specifically tailored for active-matrix full-color devices. It standardly supports substrates up to 200 mm in diameter, optimizing its usability in specialized manufacturing contexts.

SATELLA

EBX 2000

EI-7K

EX 650-C16

EBX 2000C

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).

EI-5Z

EBV-6DA

MBE-BC2400

EBX  6D

EX 550-C10

EBH 6

EBV-6CH

EX-400

EBX 1000C

EBX-16C

EBX 1000

EI-OPT

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

EI-5K

The EI-5 is a Batch or Loard Lock Type High Vacuum Evaporation System. It has a substrate size: φ2 to 6 inch Supports rectangular,Si, compounds, glass and ceramics substrates"

ei-5

EBX-10C

Mini-Lab

Loaded number / Revolution dome: 44 pc…Φ4 in / 20 pc…Φ6 in
SS distance: 900mm
Substrate holder: Revolution, Planetary or Satellite can be selected
Incident angle (Lift-off): 3.3°…Φ 4 in 4.9°…Φ 6 in

ei-7

Batch Type System
Various evaporation sources can be loaded. (EB,
RH, EB + RH)

Substrate size: φ2 to 6 inch Supports rectangular,
Si, compounds, glass and ceramics substrates

EI-7L

ULVAC

概述

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最熱門的 ULVAC Thermal Evaporators

EI-5T

SATELLA

EI-501z

EBX 2000

利用 Moov 將其上架並立即找到完美的買家。

所有 ULVAC Thermal Evaporators