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描述
無描述配置
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 代工型號說明
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.文檔
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NIKON
NSR-SF100
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
112206
晶圓尺寸:
8"/200mm
年份:
2003
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描述
無描述配置
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 代工型號說明
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.文檔
無文檔