描述

Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.

配置

0.13 0.82 4:1 25*33 20

OEM 代工型號說明

The NSR-S206D features a lens with the world’s highest numerical aperture (N.A. 0.82), along with 248nmwavelength KrF excimer lasers. Incorporating a lens-based scanning system, this stepper enables mass production of cutting-edge devices with 110nm or better design rules using a KrF excimer laser. The NSR-S206D provides a high throughput of 88 or more 300mm wafers/hour, or 147 or more 200mm wafers/hour