描述
5x Reduction Stepper配置
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 代工型號說明
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類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131961
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
GCA
AutoStep 200
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131961
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
5x Reduction Stepper配置
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 代工型號說明
未提供文檔
無文檔