描述
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.配置
0.35 0.45~0.57 4:1 26*33 45OEM 代工型號說明
FPA-5500iZ large-field i-line stepper for lowest CoO on non-critical layers. This high-productivity 365nm step-and-repeat system matches existing KrF/ArF scanner fields (26x33mm) for low-cost rough layer exposure.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131684
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5500iZ+
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131684
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.配置
0.35 0.45~0.57 4:1 26*33 45OEM 代工型號說明
FPA-5500iZ large-field i-line stepper for lowest CoO on non-critical layers. This high-productivity 365nm step-and-repeat system matches existing KrF/ArF scanner fields (26x33mm) for low-cost rough layer exposure.文檔
無文檔