描述

Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities. Features: Automatic wafer handling system Automatic reticle library management system Programmable reticle masking blades (blinds) Automatic focus and leveling Automatic wafer alignment Automatic reticle alignment Lens magnification control Automatic exposure light dose control Automatic pattern optimization design calculations Fault display and alarm system Main Unit: Projection Lens Illumination System Auto Focus and Leveling System Reticle Alignment System Wafer Alignment System Control Cabinet: Stage Control Unit Laser Interferometer Counter Reticle Alignment Control Unit Lens Control Unit Wafer Transfer Control Unit Power Control Unit Reticle Transfer Control Unit User/Operating Interface Computer System CRT (Monitor) ITV Controller KrF Excimer Laser

配置

Resolution ≧0.15-0.18μm Depth of Focus Range≧0.30μm Open Frame Check No dark spot Distortion DX、DY≦30nm Illumination Intensity ≧13000W/㎡ Illumination Uniformity ≦±1.5% Light Integrator Repeatability ≦±1.3% Masking Blade Accuracy ≦±100μm Auto Focus Performance 3σ≦80nm Mechanical Pre-alignment Accuracy 3σ x,y≦30μm TV Pre-alignment Accuracy Range≦3μm Stepping Repeatability Total 3σ≦25nm Overlay Accuracy Total |m|+3σ≦35nm Throughput ≧120 Wafers/Hr Wafer Cycling Reliability No Trouble Reticle Cycling Reliability No Trouble

OEM 代工型號說明

The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.