描述
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.18 0.60~0.73 4:1 26*33 35OEM 代工型號說明
The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131688
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5000ES3
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131688
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.18 0.60~0.73 4:1 26*33 35OEM 代工型號說明
The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.文檔
無文檔