描述
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.配置
0.35 0.45~0.63 5:1 22*26 50OEM 代工型號說明
The FPA-3000i5+ is a high productivity mix-and-match partner with Canon excimer series scanners and steppers. Wide-field lens with extra NA variability supports a variety of fine patterning processes. This highly proven and successful veteran of the Canon stepper line-up has been a best-selling product since its release in 1996. Features: -Supports varieties of fine pattern demands. High resolution, wide-field lens, extra NA variability, plus reticle options. -High alignment accuracy for CMP processes. Two off-axis methods in addition to Canon's original technology文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131681
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CANON
FPA-3000i5+
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131681
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.配置
0.35 0.45~0.63 5:1 22*26 50OEM 代工型號說明
The FPA-3000i5+ is a high productivity mix-and-match partner with Canon excimer series scanners and steppers. Wide-field lens with extra NA variability supports a variety of fine patterning processes. This highly proven and successful veteran of the Canon stepper line-up has been a best-selling product since its release in 1996. Features: -Supports varieties of fine pattern demands. High resolution, wide-field lens, extra NA variability, plus reticle options. -High alignment accuracy for CMP processes. Two off-axis methods in addition to Canon's original technology文檔
無文檔