描述
PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -配置
無配置OEM 代工型號說明
DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 12 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
149301
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/750F
類別
Steppers & Scanners
上次驗證: 12 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
149301
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -配置
無配置OEM 代工型號說明
DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.文檔
無文檔