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描述
193NM ARF SCANNER配置
無配置OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
128073
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1400
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
128073
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
193NM ARF SCANNER配置
無配置OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.文檔
無文檔