描述
無描述配置
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 代工型號說明
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
138151
晶圓尺寸:
12"/300mm
年份:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1060K
類別
Steppers & Scanners
上次驗證: 今日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
138151
晶圓尺寸:
12"/300mm
年份:
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 代工型號說明
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.文檔
無文檔