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描述
Function: Exposure machine Structure: Modular CD 0.2配置
無配置OEM 代工型號說明
The PAS 5500/750E DUV Step & Scan system enables 130nm mass production using mature 248nm KrF technology. This is made possible by advancements in all major subsystems of the PAS 5500 system, resulting in the required imaging and overlay performance. The PAS 5500/750E combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest innovations in the AERIAL II™ illumination technology, including QUASAR™ multipole illumination and optional multiple exposure capability. The system is equipped with the proven TTL alignment system as well as with ATHENA ™ for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 30nm. A 2kHz 20W KrF laser with Variable Laser Frequency Control in combination with the high speed scanning stages and the high optical transmission of the complete system provide a production throughput of 120 200mm wph with the lowest possible laser Cost of Operation.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
123818
晶圓尺寸:
未知
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/750E
類別
Steppers & Scanners
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
123818
晶圓尺寸:
未知
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Function: Exposure machine Structure: Modular CD 0.2配置
無配置OEM 代工型號說明
The PAS 5500/750E DUV Step & Scan system enables 130nm mass production using mature 248nm KrF technology. This is made possible by advancements in all major subsystems of the PAS 5500 system, resulting in the required imaging and overlay performance. The PAS 5500/750E combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest innovations in the AERIAL II™ illumination technology, including QUASAR™ multipole illumination and optional multiple exposure capability. The system is equipped with the proven TTL alignment system as well as with ATHENA ™ for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 30nm. A 2kHz 20W KrF laser with Variable Laser Frequency Control in combination with the high speed scanning stages and the high optical transmission of the complete system provide a production throughput of 120 200mm wph with the lowest possible laser Cost of Operation.文檔
無文檔