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描述
I-Line Stepper配置
280nm, I-Line StepperOEM 代工型號說明
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
90944
晶圓尺寸:
8"/200mm
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
90944
晶圓尺寸:
8"/200mm
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
I-Line Stepper配置
280nm, I-Line StepperOEM 代工型號說明
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.文檔
無文檔