ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

ASML

PAS 5500/400

Steppers & Scanners

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ASML

PAS 5500/400

PAS 5500/400

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PAS 5500/400