描述
無描述配置
DUV Stepper - Lens Unit, Cables and Panels onlyOEM 代工型號說明
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.文檔
無文檔
ASML
PAS 5500/300C
已驗證
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
17645
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/300C
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
17645
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
DUV Stepper - Lens Unit, Cables and Panels onlyOEM 代工型號說明
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.文檔
無文檔