描述
Function: exposure machine Structure: modular module structure CD 0.4um配置
無配置OEM 代工型號說明
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
123815
晶圓尺寸:
未知
年份:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASML
PAS 5500/100D
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
123815
晶圓尺寸:
未知
年份:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Function: exposure machine Structure: modular module structure CD 0.4um配置
無配置OEM 代工型號說明
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60文檔
無文檔