FOCUS FE VII
概述
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.
活躍中的上架商品
7
服務
檢驗、保險、評估、物流
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.
7
檢驗、保險、評估、物流
