描述

無描述

配置

Thickness Measurement

OEM 代工型號說明

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.

文檔

無文檔

ONTO / RUDOLPH / AUGUST

FOCUS FE VII

已驗證

類別

Elipsometry

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used

作業狀態:

未知

產品編號:

103869

晶圓尺寸:

8"/200mm

年份:

2002

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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Elipsometry

年份: 0條件: 二手

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Elipsometry

年份: 2002條件: 二手

上次驗證超過60天前

ONTO / RUDOLPH / AUGUST

FOCUS FE VII

已驗證

類別

Elipsometry

上次驗證: 超過60天前

listing-photo-c779630ed75e4bc59dc1ff0ec85f5ee5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/30409/c779630ed75e4bc59dc1ff0ec85f5ee5/45b7524fe5c04eaca630927debc5083f_202203011117553linealbum20211111rudolph2203013_mw.jpg

關鍵商品詳情

條件:

Used

作業狀態:

未知

產品編號:

103869

晶圓尺寸:

8"/200mm

年份:

2002

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

描述

無描述

配置

Thickness Measurement

OEM 代工型號說明

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.