概述

The QS-600 is a new addition to the QS series of FT-IR based instruments, designed specifically for use by silicon producers. It is capable of measuring normal oxygen and carbon levels, as well as oxygen and carbon impurities in silicon substrates using PPB (p-polarized Brewster) angle measurement. The system features high-performance optics, precise and accurate measurements, and automatic computer-selectable reflection and transmission modes. The robotic wafer handler is compact, clean room compatible, and can handle 100mm - 200mm wafers or up to 2mm thick silicon slices. The X-Y stage allows for unlimited user-defined mapping patterns and contour maps to be generated. Overall, the QS-600 is a powerful tool for semiconductor analysis.