概述

The FEI Nova NanoLab 200 is a powerful tool for researchers and developers working with complex structures below 100 nanometers. It combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and deposition to provide advanced capabilities and flexibility. This tool complements existing nanotechnology laboratory tools and extends the range of applications for nanoscale prototyping, machining, 2D and 3D-characterization, and analysis.