概述

Defect Review SEM supports next-generation photomasks The E5610 is a MASK DR-SEM(Defect Review - Scanning Electron Microscope) for reviewing and classifying ultra-small defects in photomask and blanks. Utilizing Advantest's highly stable, full automatic image capture technology, the E5610 easily imports defect location data from mask inspection systems and automatically images the locations. In addition, it features a newly developed EDS(Energy Dispersive X-ray Spectrometry) module that performs elemental analysis. With its high-accuracy, high-throughput defect review capability, the E5610 is expected to contribute to next-generation photomask production quality improvement and shorter manufacturing TAT.