概述

The E3650 using Advantest's proprietary electron beam scanning technology, the new tool measures fine pattern dimensions on photomasks with higher precision and stability.The E3650 is the newest entry in the company's E3600 series, which has been widely accepted in the photomask SEM market. It enables measurement throughput to be doubled compared with the existing model, the E3640. E3650's higher throughput enables massive measurement required by more complex patterning and increased number of masks due to multiple patterning. In addition to leading-edge photomasks, the new tool also demonstrates superior performance when measuring EUV masks and master templates for nanoimprint applications.