描述
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases配置
無配置OEM 代工型號說明
未提供文檔
無文檔
MATTSON / STEAG / AST
HEATPULSE 2101
已驗證
類別
RTP/RTA
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
16249
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATTSON / STEAG / AST
HEATPULSE 2101
類別
RTP/RTA
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
16249
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases配置
無配置OEM 代工型號說明
未提供文檔
無文檔