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MATTSON / STEAG / AST HEATPULSE 2101
    描述
    Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
    配置
    無配置
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    MATTSON / STEAG / AST

    HEATPULSE 2101

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    已驗證

    類別
    RTP/RTA

    上次驗證: 超過60天前

    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    16249

    晶圓尺寸:

    未知

    年份:

    未知

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    MATTSON / STEAG / AST HEATPULSE 2101

    MATTSON / STEAG / AST

    HEATPULSE 2101

    RTP/RTA
    年份: 0條件: 二手
    上次驗證超過60天前

    MATTSON / STEAG / AST

    HEATPULSE 2101

    verified-listing-icon
    已驗證
    類別
    RTP/RTA
    上次驗證: 超過60天前
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/0qcDqzRkf3-ztVZnYijB97cMmFUc22yWxRY-gVjhD7o_20190315_091655_f
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/z9wNnuKXgMFjUJtFxAxpLp_y9OrSIS3SXLBiX_WMRJ4_20190315_091655_f
    listing-photo-ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/Ot4uSyt7j-OkIRBJeE4orTieeZmN71mOLX5X1zTe7fk/ERbolUfIA_denbaNmr7cCSPAFGCuvgdJgdLTxkqHa6Q/IfjzAY1YDgq1Af_Ky8RpsgsYhudtRwO79gkSdj9FMiQ_20190315_091655_f
    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    16249

    晶圓尺寸:

    未知

    年份:

    未知

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases
    配置
    無配置
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    類似上架商品
    查看全部
    MATTSON / STEAG / AST HEATPULSE 2101

    MATTSON / STEAG / AST

    HEATPULSE 2101

    RTP/RTA年份: 0條件: 二手上次驗證: 超過60天前