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描述
無描述配置
無配置OEM 代工型號說明
The Applied Vantage Radiance RTP is a dedicated, two-chamber rapid thermal processing (RTP) solution for 300mm high-volume chip manufacturing. The Vantage system combines world-class Radiance 300mm RTP technology with a streamlined platform design to deliver industry-leading productivity and cost of ownership for 300mm volume manufacturing. The Vantage Radiance RTP interfaces up to two process chambers directly to the factory interface and track robot. Vantage maintains a <1 ppm oxygen ambient for critical anneals without the use of a mainframe or loadlock. The system supports all atmospheric annealing applications, including implant annealing, spike annealing and salicidation, as well as dry rapid thermal oxidation. Radiance chamber performance is equivalent to that on a Centura cluster tool, and Radiance technology and enhancements provide Vantage extendability to <90nm nodes. Mechanical throughput of the system exceeds 100 wafers per hour due to its simplified wafer transfer sequencing. Chipmakers quickly install and qualify the system as Vantage is delivered as a single, integrated unit. The Vantage platform has also demonstrated ease of maintenance and high reliability in volume production.文檔
無文檔
PREFERRED
SELLER
類別
RTP/RTA
上次驗證: 超過60天前
Buyer pays 12% premium of final sale price
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
120203
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PREFERRED
SELLER
APPLIED MATERIALS (AMAT)
VANTAGE RADIANCE
類別
RTP/RTA
上次驗證: 超過60天前
Buyer pays 12% premium of final sale price
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
120203
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The Applied Vantage Radiance RTP is a dedicated, two-chamber rapid thermal processing (RTP) solution for 300mm high-volume chip manufacturing. The Vantage system combines world-class Radiance 300mm RTP technology with a streamlined platform design to deliver industry-leading productivity and cost of ownership for 300mm volume manufacturing. The Vantage Radiance RTP interfaces up to two process chambers directly to the factory interface and track robot. Vantage maintains a <1 ppm oxygen ambient for critical anneals without the use of a mainframe or loadlock. The system supports all atmospheric annealing applications, including implant annealing, spike annealing and salicidation, as well as dry rapid thermal oxidation. Radiance chamber performance is equivalent to that on a Centura cluster tool, and Radiance technology and enhancements provide Vantage extendability to <90nm nodes. Mechanical throughput of the system exceeds 100 wafers per hour due to its simplified wafer transfer sequencing. Chipmakers quickly install and qualify the system as Vantage is delivered as a single, integrated unit. The Vantage platform has also demonstrated ease of maintenance and high reliability in volume production.文檔
無文檔