概述

The Centura RTP XE is a Rapid Thermal Processing system introduced in 1997. It features improved productivity, higher throughput, and reduced power consumption. It also includes the TempMatchTM temperature calibration tool for precise temperature matching among multiple chambers and systems. New applications include In-Situ Steam Generation, Nitric Oxide nitridation for gate dielectrics, and BPSG reflow capability. The system is available for both 200mm and 300mm applications, delivering process uniformity for 0.18mm devices and slip-free results up to 1100°C at a rate of 100°C/sec.