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STS HRM
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    配置
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    OEM 代工型號說明
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
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    STS

    HRM

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    RIE/ICP

    上次驗證: 超過60天前

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    Used

    作業狀態:

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    產品編號:

    84050

    晶圓尺寸:

    未知

    年份:

    未知

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    STS HRM

    STS

    HRM

    RIE/ICP
    年份: 0條件: 二手
    上次驗證超過60天前

    STS

    HRM

    verified-listing-icon
    已驗證
    類別
    RIE/ICP
    上次驗證: 超過60天前
    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/6582f22cec8d4f969ba3e18ca306b0af_e056e7cfffb64bd3a8c045aa83e411801201a_mw.jpeg
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    listing-photo-1bcbd1b5caa440beba1a464503200b77-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44711/1bcbd1b5caa440beba1a464503200b77/56916c84e90a46668786aba79a94fa2c_1a387f6ff23142a5ab07bc03f2654e7a_mw.jpeg
    關鍵商品詳情
    條件:

    Used

    作業狀態:

    未知

    產品編號:

    84050

    晶圓尺寸:

    未知

    年份:

    未知

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    文檔

    無文檔

    類似上架商品
    查看全部
    STS HRM

    STS

    HRM

    RIE/ICP年份: 0條件: 二手上次驗證: 超過60天前