概述

ZEISS MeRiT neXT tool is the industry standard for high-end photomask repairs. By using ZEISS electron beam column, it enables the repair of smallest defects on many different types of photomasks. Clear and opaque defects can be repaired based on exposure with focused electron beams and adsorption of precursor molecules. It features a minimum repair size of 15nm. MeRiT® neXT systems are currently employed in mask shops all over the world to repair all kinds of standard DUV and EUV photomasks down to 7nm technology node.