描述
Defect Detection配置
Software Version: 4.2.24 Process: Reticle InspectionOEM 代工型號說明
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.文檔
無文檔
KLA
SL301
類別
Reticle / Mask Inspection
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
153866
晶圓尺寸:
12"/300mm
年份:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Defect Detection配置
Software Version: 4.2.24 Process: Reticle InspectionOEM 代工型號說明
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.文檔
無文檔