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TEL / MRC ECLIPSE MARK IV
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Eclipse Mark IV is the latest generation PVD tool from the highly successful Eclipse family. It offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance. The system achieves high throughput in a high vacuum environment through the use of serial wafer handling, resulting in 80% fewer wafer transfers than a traditional cluster tool. The Eclipse Mark IV has a footprint of 44 square feet and can be configured for etch or deposition, providing full capability for today’s contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. Wafer temperature is regulated by backplane heaters and the chambers have world class vacuum leak rates and base pressures.
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    TEL / MRC

    ECLIPSE MARK IV

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    已驗證

    類別
    PVD / Sputtering

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    79338


    晶圓尺寸:

    6"/150mm


    年份:

    未知

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    Money Back Guarantee
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    TEL / MRC ECLIPSE MARK IV

    TEL / MRC

    ECLIPSE MARK IV

    PVD / Sputtering
    年份: 1998條件: 二手
    上次驗證超過30天前

    TEL / MRC

    ECLIPSE MARK IV

    verified-listing-icon
    已驗證
    類別
    PVD / Sputtering
    上次驗證: 超過60天前
    listing-photo-749182e1d9d54a3e8af71f29c61f3637-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    79338


    晶圓尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Eclipse Mark IV is the latest generation PVD tool from the highly successful Eclipse family. It offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance. The system achieves high throughput in a high vacuum environment through the use of serial wafer handling, resulting in 80% fewer wafer transfers than a traditional cluster tool. The Eclipse Mark IV has a footprint of 44 square feet and can be configured for etch or deposition, providing full capability for today’s contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. Wafer temperature is regulated by backplane heaters and the chambers have world class vacuum leak rates and base pressures.
    文檔

    無文檔

    類似上架商品
    查看全部
    TEL / MRC ECLIPSE MARK IV

    TEL / MRC

    ECLIPSE MARK IV

    PVD / Sputtering年份: 1998條件: 二手上次驗證: 超過30天前
    TEL / MRC ECLIPSE MARK IV

    TEL / MRC

    ECLIPSE MARK IV

    PVD / Sputtering年份: 0條件: 二手上次驗證: 超過60天前
    TEL / MRC ECLIPSE MARK IV

    TEL / MRC

    ECLIPSE MARK IV

    PVD / Sputtering年份: 0條件: 二手上次驗證: 超過60天前