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描述
Temperature Monitoring配置
無配置OEM 代工型號說明
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C文檔
無文檔
KLA
1530
類別
Probers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91949
晶圓尺寸:
8"/200mm
年份:
未知
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描述
Temperature Monitoring配置
無配置OEM 代工型號說明
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C文檔
無文檔