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TEL / TOKYO ELECTRON UNITY IIE 855SS
    描述
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    OEM 代工型號說明
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
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    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

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    已驗證

    類別

    Plasma Etch
    上次驗證: 超過60天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    74217


    晶圓尺寸:

    8"/200mm


    年份:

    未知

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    TEL / TOKYO ELECTRON UNITY IIE 855SS
    TEL / TOKYO ELECTRONUNITY IIE 855SSPlasma Etch
    年份: 0條件: 二手
    上次驗證18 天前

    TEL / TOKYO ELECTRON

    UNITY IIE 855SS

    verified-listing-icon

    已驗證

    類別

    Plasma Etch
    上次驗證: 超過60天前
    listing-photo-1b44f52855184c719ba5e913c79a93e6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/41457/1b44f52855184c719ba5e913c79a93e6/bd70b45abe474facadede77326ddd4ef_e42703a3883f4f00b2d5f0e2cf6cef2c45005c_mw.jpeg
    listing-photo-1b44f52855184c719ba5e913c79a93e6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/41457/1b44f52855184c719ba5e913c79a93e6/4c28389c53764f058b711503b6ecc532_24add3ee6b9241159c9446fe4dcf1d4645005c_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    74217


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, which also includes the M and Me models, each designed for specific applications to achieve higher productivity and reliability. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM™ chambers, and is available in 84, 85 and 88 models. The system boasts high throughput, a compact design, lower CoO, and ease of maintenance. The Me model also includes a Flow Control System. With its advanced features and capabilities, the UNITY® IIe is a powerful tool for achieving optimal process results.
    文檔

    無文檔

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    查看全部
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