描述

ICP double Chmbaer

配置

Process chamber(ICP) X 2 Slit door X 2 Heater block X 2 Lift Pin X 2 Top plate X 2 Robot X 1 Shuttle X 1 Cassette nest X 1 Shuttle dump X 1 Loadlock X 1 Cooling cahmebr X 1 Operator Box X 1 Temp panel X 2 Gas panel X 2 Gas box X 2 Cassdoor X 1 ARM X 1 Paddle X 2 DC BOX X 1 AC BOX X 1

OEM 代工型號說明

MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.

文檔

instructions.pdf

MATTSON

ASPEN II

已驗證

類別

Dry / Plasma Etch

上次驗證: 超過60天前

關鍵商品詳情

條件:

Refurbished

作業狀態:

未知

產品編號:

102019

晶圓尺寸:

4"/100mm, 6"/150mm, 8"/200mm

HDD / Software:

Yes

Pumps:

Process:

STRIP

Plasma Gas:

CF4,H2N2,O2,N2

年份:

1998

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