描述
ICP double Chmbaer配置
Process chamber(ICP) X 2 Slit door X 2 Heater block X 2 Lift Pin X 2 Top plate X 2 Robot X 1 Shuttle X 1 Cassette nest X 1 Shuttle dump X 1 Loadlock X 1 Cooling cahmebr X 1 Operator Box X 1 Temp panel X 2 Gas panel X 2 Gas box X 2 Cassdoor X 1 ARM X 1 Paddle X 2 DC BOX X 1 AC BOX X 1OEM 代工型號說明
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.文檔
MATTSON
ASPEN II
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
102019
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MATTSON
ASPEN II
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
102019
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available