描述
Fully intact and functional配置
無配置OEM 代工型號說明
The 4520XLE system has a wide process flexibility that allows fabs to develop processes for multiple dual damascene structures and investigate how well each can integrate into the interconnect process. Its broad process window provides this flexibility through independently controlled power settings that regulate charged particle flux and energy along with a wide operating pressure range. The system is able to run high pressure processes in situ, such as photoresist strip and nitride finish etch, eliminating extra wafer handling steps. This in situ process capability lowers overall costs per wafer.文檔
無文檔
LAM RESEARCH CORPORATION
RAINBOW 4520XLe
已驗證
類別
Plasma Etch
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
98803
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
RAINBOW 4520XLe
類別
Plasma Etch
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
98803
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Fully intact and functional配置
無配置OEM 代工型號說明
The 4520XLE system has a wide process flexibility that allows fabs to develop processes for multiple dual damascene structures and investigate how well each can integrate into the interconnect process. Its broad process window provides this flexibility through independently controlled power settings that regulate charged particle flux and energy along with a wide operating pressure range. The system is able to run high pressure processes in situ, such as photoresist strip and nitride finish etch, eliminating extra wafer handling steps. This in situ process capability lowers overall costs per wafer.文檔
無文檔